Method for forming color filter

Details Method for forming color filter Method for forming color filter

2006-07-20

2008-08-12

Nguyen, Tuan H (Department: 2813)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S070000

Reexamination Certificate

active

07410822

ABSTRACT:
A method for forming a color filter is provided. The method comprises steps of providing a substrate having a passivasion layer formed thereon. The substrate has at least one complementary metal-oxide semiconductor formed therein and the passivasion layer has at least trench formed therein in a peripheral region of the substrate. At least two adjacent color filter blocks are sequentially formed over the passivasion layer and the color filter blocks comprises a first color filter block and a second color filter block. The first color filter block and the second color filter block are disposed within a display region of the substrate. Moreover, the material for forming the first color filter, which is formed prior to the formation of the second color filter block, further fills the trench in the peripheral region simultaneously with a formation of the first color filter block.

REFERENCES:
patent: 2002/0197763 (2002-12-01), Yeh et al.
patent: 2007/0010042 (2007-01-01), Li
patent: 2007/0125935 (2007-06-01), Yaung

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