Photothermographic material

Details Photothermographic material Photothermographic material

2007-02-21

2008-08-26

Chea, Thorl (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

C430S517000, C430S523000, C430S531000, C430S534000, C430S619000, C430S631000, C430S640000, C430S642000

Reexamination Certificate

active

07416838

ABSTRACT:
The present invention provides a photothermographic material having, on one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and at least one non-photosensitive layer which is disposed on the same side of the support as the image forming layer and farther from the support than the image forming layer, wherein the non-photosensitive layer includes at least a copolymer latex of an acrylate or methacrylate having a fluorine atom and a monomer component having a hydrophobic group, and the surface of the side having the image forming layer includes convex portions having a height of 1.5 μm or higher in an amount of from 20 to 2000 per 1 mm2. A photothermographic material which exhibits excellent film physical properties and high image quality is provided.

REFERENCES:
patent: 6190854 (2001-02-01), Sampei
patent: 6599686 (2003-07-01), Geisler et al.
patent: 2004/0063049 (2004-04-01), Nakajima et al.
patent: 2004/0115572 (2004-06-01), Tsukada et al.
patent: 2005/0214700 (2005-09-01), Yamamoto et al.
patent: A 2003-262934 (2003-09-01), None

Affiliated with

Also associated with

Rating

Photothermographic material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photothermographic material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photothermographic material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4007940