Substrate processing method of and substrate processing...

Details Substrate processing method of and substrate processing... Substrate processing method of and substrate processing...

2006-05-11

2008-08-12

Carrillo, Sharidan (Department: 1792)

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

C134S006000, C134S025400, C134S026000, C134S030000, C134S032000, C134S035000, C134S036000, C134S042000, C134S902000

Reexamination Certificate

active

07410545

ABSTRACT:
A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit1and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism3to a spin-processing unit2. The substrate rotates in the spin-processing unit2, thereby adjusting the thickness of the aqueous film on the substrate surface. As the aqueous film is then frozen, the volume of the aqueous film expands, adhesion between the substrates and particles adhering to the substrate surface becomes weak, or further the particles are separated from the substrate surface. The substrate transportation mechanism3transports thus frozen substrate to the cleaning unit1from the spin-processing unit2, and the substrate is immersed in a processing liquid held inside the processing bath. The overflowing processing liquid thaws and removes the aqueous film, and particles on the substrate surface are discharged outside the substrate.

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