Methods of forming a plurality of capacitors

Details Methods of forming a plurality of capacitors Methods of forming a plurality of capacitors

2004-08-27

2008-10-21

Smith, Zandra (Department: 2822)

Semiconductor device manufacturing: process

Making passive device

Stacked capacitor

C438S396000

Reexamination Certificate

active

07439152

ABSTRACT:
The invention includes methods of forming a plurality of capacitors. In one implementation, a plurality of capacitor electrode openings is formed over a substrate. Individual of the capacitor electrode openings are bounded on a first pair of opposing sides by a first capacitor electrode-forming material at one elevation and on a second pair of opposing sides by a different second capacitor electrode-forming material at the one elevation. Individual capacitor electrodes are formed within individual of the capacitor electrode openings. The capacitor electrodes are incorporated into a plurality of capacitors. Other aspects and implementations are contemplated.

REFERENCES:
patent: 4517729 (1985-05-01), Batra
patent: 5236860 (1993-08-01), Fazan et al.
patent: 5340763 (1994-08-01), Dennison
patent: 5401681 (1995-03-01), Dennison et al.
patent: 5467305 (1995-11-01), Bertin et al.
patent: 5498562 (1996-03-01), Dennison et al.
patent: 5532089 (1996-07-01), Adair et al.
patent: 5604698 (1997-02-01), Takaishi
patent: 5605857 (1997-02-01), Jost et al.
patent: 5652164 (1997-07-01), Dennison et al.
patent: 5654222 (1997-08-01), Sandhu et al.
patent: 5686747 (1997-11-01), Jost et al.
patent: 5702990 (1997-12-01), Jost et al.
patent: 5705838 (1998-01-01), Jost et al.
patent: 5767561 (1998-06-01), Frei et al.
patent: 5821140 (1998-10-01), Jost et al.
patent: 5869382 (1999-02-01), Kubota
patent: 5900660 (1999-05-01), Jost et al.
patent: 5955758 (1999-09-01), Sandhu et al.
patent: 5981350 (1999-11-01), Geusic et al.
patent: 5990021 (1999-11-01), Prall et al.
patent: 6037212 (2000-03-01), Chao
patent: 6037218 (2000-03-01), Dennison et al.
patent: 6059553 (2000-05-01), Jin et al.
patent: 6090700 (2000-07-01), Tseng
patent: 6108191 (2000-08-01), Manning
patent: 6110774 (2000-08-01), Jost et al.
patent: 6180450 (2001-01-01), Dennison
patent: 6204143 (2001-03-01), Roberts et al.
patent: 6204178 (2001-03-01), Marsh
patent: 6258650 (2001-07-01), Sunouchi
patent: 6274497 (2001-08-01), Lou
patent: 6303518 (2001-10-01), Tian et al.
patent: 6303956 (2001-10-01), Sandhu et al.
patent: 6323528 (2001-11-01), Yamazaki et al.
patent: 6331461 (2001-12-01), Juengling
patent: 6372554 (2002-04-01), Kawakita et al.
patent: 6383861 (2002-05-01), Gonzalez et al.
patent: 6399490 (2002-06-01), Jammy et al.
patent: 6403442 (2002-06-01), Reinberg
patent: 6432472 (2002-08-01), Farrell et al.
patent: 6458653 (2002-10-01), Jang
patent: 6458925 (2002-10-01), Fasano
patent: 6459138 (2002-10-01), Reinberg
patent: 6645869 (2003-11-01), Chu et al.
patent: 6656748 (2003-12-01), Hall et al.
patent: 6667502 (2003-12-01), Agarwal et al.
patent: 6673693 (2004-01-01), Kirchhoff
patent: 6709978 (2004-03-01), Geusic et al.
patent: 6720232 (2004-04-01), Tu et al.
patent: 6767789 (2004-07-01), Manning
patent: 6784112 (2004-08-01), Arita et al.
patent: 6812513 (2004-11-01), Geusic et al.
patent: 6822261 (2004-11-01), Manning
patent: 6844230 (2005-01-01), Reinberg
patent: 6849496 (2005-02-01), Jaiprakash et al.
patent: 6897109 (2005-05-01), Jin et al.
patent: 6927122 (2005-08-01), Geusic et al.
patent: 6930640 (2005-08-01), Manning
patent: 7064365 (2006-06-01), An et al.
patent: 7073969 (2006-07-01), Kamm
patent: 7074669 (2006-07-01), Iijima et al.
patent: 7081384 (2006-07-01), Birner et al.
patent: 7084451 (2006-08-01), Forbes et al.
patent: 7125781 (2006-10-01), Manning et al.
patent: 7160788 (2007-01-01), Sandhu et al.
patent: 7179706 (2007-02-01), Patraw et al.
patent: 7199005 (2007-04-01), Sandhu et al.
patent: 2001/0026974 (2001-10-01), Reinberg
patent: 2001/0044181 (2001-11-01), Nakamura
patent: 2002/0022339 (2002-02-01), Kirchhoff
patent: 2002/0039826 (2002-04-01), Reinberg
patent: 2002/0086479 (2002-07-01), Reinberg
patent: 2002/0090779 (2002-07-01), Jang
patent: 2002/0163026 (2002-11-01), Park
patent: 2003/0153146 (2003-08-01), Won et al.
patent: 2003/0178684 (2003-09-01), Nakamura
patent: 2003/0190782 (2003-10-01), Ko et al.
patent: 2003/0227044 (2003-12-01), Park
patent: 2004/0018679 (2004-01-01), Yu et al.
patent: 2004/0056295 (2004-03-01), Agarwal et al.
patent: 2004/0150070 (2004-08-01), Okada et al.
patent: 2004/0188738 (2004-09-01), Farnworth
patent: 2005/0051822 (2005-03-01), Manning
patent: 2005/0054159 (2005-03-01), Manning et al.
patent: 2005/0158949 (2005-07-01), Manning
patent: 2005/0287780 (2005-12-01), Manning et al.
patent: 2006/0014344 (2006-01-01), Manning
patent: 2006/0024958 (2006-02-01), Ali
patent: 2006/0046420 (2006-03-01), Manning
patent: 2006/0051918 (2006-03-01), Busch et al.
patent: 2006/0063344 (2006-03-01), Manning et al.
patent: 2006/0063345 (2006-03-01), Manning et al.
patent: 2006/0115951 (2006-06-01), Mosley
patent: 2006/0121672 (2006-06-01), Basceri et al.
patent: 2006/0186451 (2006-08-01), Dusberg et al.
patent: 2006/0211211 (2006-09-01), Sandhu et al.
patent: 2006/0261440 (2006-11-01), Manning
patent: 2006/0263968 (2006-11-01), Manning
patent: 2007/0032014 (2007-02-01), Sandhu et al.
patent: 2007/0048976 (2007-03-01), Raghu
patent: 2007/0099328 (2007-05-01), Chiang et al.
patent: 2007/0145009 (2007-06-01), Fucsko et al.
patent: 4447804 (2002-01-01), None
patent: 4447804 (2002-01-01), None
patent: WO 2005/024936 (2005-03-01), None
patent: US2006/006806 (2007-03-01), None
U.S. Appl. No. 11/360,540, filed Feb. 23, 2006, Rana.
U.S. Appl. No. 11/580,418, filed Oct. 11, 2006, Raghu et al.
Li, X. and Bohn, P.W., “Metal-assisted chemical etching in HF/H2O2produces porous silicon”, Applied Physics Letters, vol. 77, No. 16, Oct. 16, 2000, pp. 2572-2574.
U.S. Appl. No. 11/083,489, filed Mar. 18, 2005, Sandhu et al.
U.S. Appl. No. 11/131,552, filed May 18, 2005, Manning.
U.S. Appl. No. 11/131,575, filed May 18, 2005, Manning.
U.S. Appl. No. 11/196,593, filed Aug. 2, 2005, Sandhu et al.
U.S. Appl. No. 11/272,232, filed Nov. 10, 2005, Manning et al.
U.S. Appl. No. 11/272,247, filed Nov. 10, 2005, Manning et al.
J. P. O'Sullivan et al.,The morphology and mechanism of formation of porous anodic films on aluminium, Proc. Roy. Soc. Lond. A, vol. 317, pp. 511-543 (1970).
S. Shingubara,Fabrication of nanomaterials using alumina templates, J. Nanoparticle Res., vol. 5, pp. 17-30 (2003).
S. Tan et al.,High Aspect Ratio Microstructures on Porous Anodic Aluminum Oxide, IEEE, pp. 267-272 (1995).
J. Liang et al.,Nonlithographic Fabrication of Lateral Superlattices for Nanometric Electromagnetic-Optic . . .IEEE J. Selected Topics in Quantum Electr., vol. 8, No. 5, pp. 998-1008 (Sep./Oct. 2002).
V. V. Konovalov et al.,Chemistry of Materials, Chem. Mater., vol. 11, No. 8, pp. 1949-1951 (Aug. 1999).
H. Masuda et al.,Highly ordered nanochannel-array architecture in anodic alumina, App. Phys. Lett, vol. 71, No. 19, pp. 2770-2772 (Nov. 1997).
D. Crouse et al.,Self-Assembled Nanostructures Using Anodized Alumina Thin Films for Optoelectronic Applications, IEEE, pp. 234-235 (1999).
A. Nadeem et al.,Fabrication of Microstructures Using Aluminum Anodization Techniques, pp. 274-277 (pre-2004).
C. Y. Liu et al.,Ordered anodic alumina nanochannels on focused-ion-beam-prepatterned aluminum surfaces, Appl. Phys. Lett., vol. 78, No. 1, pp. 120-122 (Jan. 2001).
Banhart,Aluminum Foams: On the Road to Real Applications, MRS Bulletin, pp. 290-295 (Apr. 2003).
Gibson et al.,Cellular Solids, MRS Bulletin, pp. 270-274 (Apr. 2003).
Green et al.,Cellular Ceramics: Intriguing Structures, Novel Properties, and Innovative Applications, MRS Bulletin, pp. 296-300 (Apr. 2003).
Green et al.,The Structure and Applications of Cellular Ceramics, Web Extra, 10 pages (Apr. 2003).
Karp et al.,Scaffolds for Tissue Engineering, MRS Bulletin, pp. 301-306 (Apr. 2003).
Kraynik,Foam Structure: From Soap Froth to Solid Foams, MRS Bulletin, pp. 275-276 (Apr. 2003).
U.S. Appl. No. 11/006,331, filed Dec. 6, 2004, Cern Basceri et al.
Maire et al., In SituX-Ray Tomography Measurements of Deformation in Cellular Solids, MRS Bulletin, pp. 284-289 (Apr. 2003).
Oh et al.,Preparation and Pore-Characteristics Control of Nano-Porous Materials Using Organometallic Building Blocks, 4 Carbon Science, No. 1, pp. 1-9 (Mar. 2003).
Onck,Scale Effects in Cellular Metals,

Affiliated with

Also associated with

Rating

Methods of forming a plurality of capacitors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods of forming a plurality of capacitors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of forming a plurality of capacitors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4003489