Semiconductor device and manufacturing method of the same

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Ball or nail head type contact – lead – or bond

Reexamination Certificate

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C257S737000, C257S738000, C257S759000, C257S780000, C257SE23020

Reexamination Certificate

active

07417326

ABSTRACT:
A semiconductor device includes a plurality of electrode layers provided at designated positions of a semiconductor substrate, an organic insulation film formed on the semiconductor substrate by selectively exposing designated areas of the electrode layers, and projection electrodes for outside connection, the projection electrodes being formed on the designated areas of the electrode layers. Thickness of the organic insulation film situated in the vicinity of the periphery of the projection electrodes is greater than thickness of the organic insulation film situated between the projection electrodes.

REFERENCES:
patent: 5055906 (1991-10-01), Mase et al.
patent: 5914536 (1999-06-01), Shizuki et al.
patent: 6426281 (2002-07-01), Lin et al.
patent: 6426556 (2002-07-01), Lin
patent: 6605524 (2003-08-01), Fan et al.
patent: 6734532 (2004-05-01), Koduri et al.
patent: 6956292 (2005-10-01), Fan et al.
patent: 6958546 (2005-10-01), Fan et al.
patent: 7008867 (2006-03-01), Lei
patent: 7135770 (2006-11-01), Nishiyama et al.
patent: 7268438 (2007-09-01), Nishiyama et al.
patent: 2002/0093107 (2002-07-01), Wu et al.
patent: 2007/0020912 (2007-01-01), Nishiyama et al.
patent: 9-191012 (1997-07-01), None
patent: 2004-200420 (2004-07-01), None
patent: 2005-322735 (2005-11-01), None
Korean Office Action dated Jul. 18, 2007 issued in corresponding Application No. 10-2006-0030781.

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