Functional device and method for producing the same, and...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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C438S738000

Reexamination Certificate

active

07410906

ABSTRACT:
A method of producing a functional device comprising an electrode layer provided as an upper layer of a layer containing an organic material, the layer being as a functional layer, wherein a step of patterning the electrode layer comprises a high speed etching step of etching the electrode layer at a rate of 10 nm/min or more.

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patent: 2003/0141807 (2003-07-01), Kawase

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