Method for purifying semiconductor gases

Details Method for purifying semiconductor gases Method for purifying semiconductor gases

2003-06-02

2008-08-19

Barry, Chester T (Department: 1797)

Liquid purification or separation

Processes

Ion exchange or selective sorption

Reexamination Certificate

active

07413661

ABSTRACT:
This invention is directed a method for producing an ultra-high purity semiconductor gas such as ammonia gas. The method includes the steps of directing an ammonia fluid having a liquid phase moisture content that is less than about 500 parts per million through an evaporation means, to produce purified vapor phase ammonia, and directing the purified vapor phase ammonia through an adsorption means to remove impurities therein and produce ultra-high purity ammonia gas.

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Thomas M. Smolen, David B. Manley and Bruce E. Poling, “Vapor-Liquid Equilibrium Data for the NH3-H20 System and Its Description with a Modified Cubic Equation of State”,Journal of Chemical and Engineering Data, vol. 36, No. 2, 1991, 202-208.

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