Photolithography process and photomask structure implemented...

Details Photolithography process and photomask structure implemented... Photolithography process and photomask structure implemented...

2004-07-20

2008-10-14

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07435512

ABSTRACT:
In a photolithography process, a photoresist layer is formed on a substrate. A photomask is aligned over the substrate to transfer pattern images defined in the photomask on the substrate. The photomask includes first and second patterns of different light transmission rates, and a dummy pattern surrounding the second pattern having a light transmission rate lower than that of the first pattern. The substrate is exposed to a light radiation through the photomask. The photoresist layer then is developed to form the pattern images. The dummy pattern is dimensionally configured to allow light transmission, but in a substantially amount so that the dummy pattern is not imaged during exposure.

REFERENCES:
patent: 6558853 (2003-05-01), Kawamura
patent: 2003/0198872 (2003-10-01), Yamazoe et al.

Affiliated with

Also associated with

Rating

Photolithography process and photomask structure implemented... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithography process and photomask structure implemented..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithography process and photomask structure implemented... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3997766