Display unit of a helmet or a vehicle or an airplane

Computer graphics processing and selective visual display system – Image superposition by optical means

Reexamination Certificate

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Details

C345S008000, C345S092000, C349S011000, C349S043000, C257S059000, C257S060000

Reexamination Certificate

active

07425931

ABSTRACT:
A method of manufacturing a semiconductor device, comprises the steps of: forming a first insulating film on a first substrate; forming a second insulating film on the first insulating film; forming an amorphous silicon film on the second insulating film; holding a metal element that promotes the crystallization of silicon in contact with a surface of the amorphous silicon film; crystallizing the amorphous silicon film through a heat treatment to obtain a crystalline silicon film; forming a thin-film transistor using the crystalline silicon film; forming a sealing layer that seals the thin-film transistor; bonding a second substrate having a translucent property to the sealing layer; and removing the first insulating film to peel off the first substrate.

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