Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-12-02
2008-05-13
Berman, Jack (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S50400H, C250S491100, C250S492220, C250S492300, C250S492230, C355S075000, C355S072000, C355S030000, C355S053000, C355S071000, C134S001000, C134S001100, C134S010000, C134S021000, C118S620000, C438S798000, C378S119000
Reexamination Certificate
active
07372049
ABSTRACT:
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.
REFERENCES:
patent: 2005/0148210 (2005-07-01), Bakker et al.
patent: 2006/0278833 (2006-12-01), Van Herpen et al.
patent: 2006/0289811 (2006-12-01), Van Herpen et al.
patent: 1 429 189 (2004-06-01), None
patent: 1 526 550 (2005-04-01), None
patent: 1 643 310 (2006-04-01), None
patent: WO 2006/0135230 (2006-12-01), None
International Search Report issued for International Patent Application No. PCT/NL2006/050303, dated Mar. 20, 2007.
Written Opinion of the International Searching Authority issued for International Patent Application No. PCT/NL2006/050303, dated Mar. 20, 2007.
D.J.W. Klunder, et al., “Debris Mitigation and Cleaning Strategies for Sn-Based Sources for EUV Lithography,” Proceedings of SPIE, vol. 5751, pp. 943-951.
W. V. Smith, Journal of Chemical Physics, “The Surface Recombination of H Atoms and OH Radicals”, pp. 110-125, (Mar. 1943).
Bernard J. Wood et al., J. Phys. Chem., “Kinetics of Hydrogen Atom Recombination of Surfaces”, pp. 1976-1983, (Apr. 17, 1961).
Klunder Derk Jan Wilfred
Van Herpen Maarten Marinus Johannes Wilhelmus
ASML Netherlands B.V.
Berman Jack
Pillsbury Winthrop Shaw & Pittman LLP
Sahu Meenakshi S
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