Method for manufacturing FFS mode LCD

Details Method for manufacturing FFS mode LCD Method for manufacturing FFS mode LCD

2005-09-09

2008-03-04

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S034000, C438S129000, C438S599000, C438S609000, C257SE33065

Reexamination Certificate

active

07338824

ABSTRACT:
In the present invention, a method for manufacturing a liquid crystal display is provided. The method includes steps of providing a substrate, forming a first metal layer on the substrate, etching the first metal layer to form a plurality of gate lines on the substrate, forming a common electrode on the substrate, forming a second metal layer on the substrate, etching the second metal layer to form a first electrode, a second electrode, a common line and a plurality of data lines on the substrate, and forming a pixel electrode overlapping the common electrode, wherein the gate lines intersect the data lines to form at least one enclosed area, the common electrode and the pixel electrode are positioned in the enclosed area, the first electrode is connected to the pixel electrode and the second electrode is connected to the data lines.

REFERENCES:
patent: 2006/0146212 (2006-07-01), Ahn et al.
patent: 2006/0285050 (2006-12-01), Yoo et al.
patent: 2006/0290867 (2006-12-01), Ahn et al.
patent: 2007/0002249 (2007-01-01), Yoo et al.

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