Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-12-08
2008-09-16
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C356S237500
Reexamination Certificate
active
07426023
ABSTRACT:
There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.
REFERENCES:
patent: 4601576 (1986-07-01), Galbraith
patent: 5172000 (1992-12-01), Scheff et al.
patent: 5680207 (1997-10-01), Hagiwara
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 5903342 (1999-05-01), Yatsugake et al.
patent: 6295168 (2001-09-01), Hoffnagle et al.
patent: 6657736 (2003-12-01), Finarov et al.
patent: 6798584 (2004-09-01), Matsumoto et al.
patent: 6995920 (2006-02-01), Nurishi
patent: 7187438 (2007-03-01), Hamamatsu et al.
patent: 7248354 (2007-07-01), Kreh et al.
Iwata Hisafumi
Nakano Hiroyuki
Ohshima Yoshimasa
Antonelli, Terry Stout & Kraus, LLP.
Hitachi , Ltd.
Nguyen Sang
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