Apparatus used for total reflection fluorescent X-ray analysis o

Details Apparatus used for total reflection fluorescent X-ray analysis o Apparatus used for total reflection fluorescent X-ray analysis o

1996-08-30

1997-06-03

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

378 79, G01N 23223

Patent

active

056362560

ABSTRACT:
An apparatus is disclosed which is used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities. The apparatus comprises a heat-resistant thin sheet containing an element or elements, as a principal component, not detected on total reflection fluorescent X-ray analysis and an x-ray source directing an X-ray as an incident X-ray at a liquid drop-like sample put on the sheet and containing very small amounts of impurities whereby the liquid drop-like sample is evaporated to a dried solid for the total reflection fluorescent X-ray analysis to be performed there.

REFERENCES:
"Total Reflection X-Ray Fluorescence Analysis for Ultratrace Surface Contamination", K. Miyazaki et al., Technical Report of IEICE, pp. 7-12 (1994).

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