Monitoring a single-wafer processing system

Details Monitoring a single-wafer processing system Monitoring a single-wafer processing system

2006-07-06

2008-03-04

Barlow, John (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Performance or efficiency evaluation

Reexamination Certificate

active

07340377

ABSTRACT:
A method of monitoring a single-wafer processing system in real-time using low-pressure based modeling techniques that include processing a wafer in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.

REFERENCES:
patent: 5642296 (1997-06-01), Saxena
patent: 6195621 (2001-02-01), Bottomfield
patent: 6351723 (2002-02-01), Maekawa
patent: 6441350 (2002-08-01), Stoddard et al.
patent: 6803548 (2004-10-01), Wang et al.
patent: 7165011 (2007-01-01), Kaushal et al.
patent: 20070030193 (2007-03-01), None
patent: 20070030194 (2007-03-01), None
A. Emami-Naeaini et al., Model-based control for semiconductor and advanced materials processing: an overview; American Control Conference, 2004, vol. 5, Jun. 30, 2004, pp. 3902-3909.
Roy G. Gordon et al., A kinetic model for step coverage by atomic layer deposition in narrow holes or trenches; Chemical Vapor Deposition, vol. 9, No. 2, Mar. 20, 2003, pp. 73-78.
European Patent Office, International Search Report and Written Opinion received in corresponding PCT Application No. PCT/US2007/065473, dated Aug. 17, 2007, 14 pgs.

Affiliated with

Also associated with

Rating

Monitoring a single-wafer processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Monitoring a single-wafer processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monitoring a single-wafer processing system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3976648