Etching a substrate: processes – Pattern or design applied by transfer
Reexamination Certificate
2005-11-29
2008-07-15
Culbert, Roberts (Department: 1763)
Etching a substrate: processes
Pattern or design applied by transfer
C216S002000, C216S052000, C977S887000
Reexamination Certificate
active
07399422
ABSTRACT:
A system and method form a nanodisk that can be used to form isolated data bits on a memory disk. The imprint stamp is formed from first and second overlapping patterns, where the patterns are selectively etched. The selective etching leaves either pits or posts on the imprint stamp. The pits or posts are imprinted on the memory disk, leaving either pits or posts on the memory disk. The pits or posts on the memory disk are processed to form relatively small and dense isolated data bits. Instability of the isolated data bits caused by outside magnetic and thermal influences is substantially eliminated.
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ASML Holding N.V.
Culbert Roberts
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