Exposure method, exposure apparatus, and method for...

Details Exposure method, exposure apparatus, and method for... Exposure method, exposure apparatus, and method for...

2007-01-26

2008-07-15

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C430S322000, C430S323000, C430S324000, C355S030000, C250S50400H

Reexamination Certificate

active

07399979

ABSTRACT:
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also includes a liquid supply part for supplying the liquid to the exposure part. The liquid supply part includes a plurality of liquid units respectively containing a plurality of liquids, and a selection unit for selecting one liquid unit from the plurality of liquid units and supplying a liquid to the exposure part.

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