Method of thin lightshield process for solid-state image...

Details Method of thin lightshield process for solid-state image... Method of thin lightshield process for solid-state image...

2008-07-22

2008-07-22

Epps, Georgia Y. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controlled circuit

C438S057000, C438S075000, C438S098000

Reexamination Certificate

active

11927870

ABSTRACT:
An image sensor includes a substrate having photosensitive areas; an insulator spanning at least a portion of the substrate; and a first and second layer of a multi-layer metallization structure, wherein the first layer forms light shield regions over selected portions of the photosensitive area as well forming circuit interconnections and barrier regions to prevent spiking into the substrate or gates at contacts in the non-imaging area; and the second layer spanning the interconnections and barrier regions of the first layer only over the non-imaging areas and the second layer overlays edges of the first layer.

REFERENCES:
patent: 5719075 (1998-02-01), Hawkins et al.
patent: 5846708 (1998-12-01), Hollis et al.
patent: 6130156 (2000-10-01), Havemann et al.
patent: 6627866 (2003-09-01), Hula et al.
patent: 6867062 (2005-03-01), Stevens
patent: 2003/0001222 (2003-01-01), Street et al.

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