Run-off path to collect liquid for an immersion lithography...

Details Run-off path to collect liquid for an immersion lithography... Run-off path to collect liquid for an immersion lithography...

2008-07-08

2008-07-08

Lee, Diane (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

11235323

ABSTRACT:
An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

REFERENCES:
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 6191429 (2001-02-01), Suwa
patent: 6788477 (2004-09-01), Lin
patent: 2002/0109850 (2002-08-01), Takai et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0109981 (2004-06-01), Lawrence et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0118184 (2004-06-01), Violette
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0169834 (2004-09-01), Richter et al.
patent: 2004/0169924 (2004-09-01), Flagello et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.
patent: 2004/0180299 (2004-09-01), Rolland et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Maria Derksen et al.
patent: 2004/0224265 (2004-11-01), Endo et al.
patent: 2004/0224525 (2004-11-01), Endo et al.
patent: 2004/0227923 (2004-11-01), Flagello et al.
patent: 2004/0253547 (2004-12-01), Endo et al.
patent: 2004/0253548 (2004-12-01), Endo et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0259008 (2004-12-01), Endo et al.
patent: 2004/0259040 (2004-12-01), Endo et al.
patent: 2004/0263808 (2004-12-01), Sewell
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0036121 (2005-02-01), Hoogendam et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0036184 (2005-02-01), Yeo et al.
patent: 2005/0036213 (2005-02-01), Mann et al.
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2005/0042554 (2005-02-01), Dierichs et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0073670 (2005-04-01), Carroll
patent: 2005/0084794 (2005-04-01), Meagley et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0117224 (2005-06-01), Shafer et al.
patent: 2005/0122497 (2005-06-01), Lyons et al.
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134815 (2005-06-01), Van Santen et al.
patent: 2005/0141098 (2005-06-01), Schuster
patent: 2005/0145803 (2005-07-01), Hakey et al.
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0146695 (2005-07-01), Kawakami
patent: 2005/0147920 (2005-07-01), Lin et al.
patent: 2005/0153424 (2005-07-01), Coon
patent: 2005/0158673 (2005-07-01), Hakey et al.
patent: 2005/0164502 (2005-07-01), Deng et al.
patent: 2005/0174549 (2005-08-01), Duineveld et al.
patent: 2005/0175940 (2005-08-01), Dierichs
patent: 2005/0185269 (2005-08-01), Epple et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0190455 (2005-09-01), Rostalski et al.
patent: 2005/0205108 (2005-09-01), Chang et al.
patent: 2005/0213061 (2005-09-01), Hakey et al.
patent: 2005/0213072 (2005-09-01), Schenker et al.
patent: 2005/0217135 (2005-10-01), O'Donnell et al.
patent: 2005/0217137 (2005-10-01), Smith et al.
patent: 2005/0217703 (2005-10-01), O'Donnell
patent: 2005/0219482 (2005-10-01), Baselmans et al.
patent: 2005/0219499 (2005-10-01), Maria Zaal et al.
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2005/0270505 (2005-12-01), Smith
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: A-57-153433 (1982-09-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-19912 (1984-02-01), None
patent: A-62-65326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-5-62877 (1993-03-01), None
patent: A-6-124873 (1994-05-01), None
patent: A-7-220990 (1995-08-01), None
patent: A-8-316125 (1996-11-01), None
patent: A 10-258249 (1998-09-01), None
patent: A-10-303114 (1998-11-01), None
patent: A-10-340846 (1998-12-01), None
patent: A-11-176727 (1999-07-01), None
patent: A-2000-58436 (2000-02-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 02/091078 (2002-11-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/109128 (2004-03-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/077154 (2004-09-01), None
patent: WO 2004/081666 (2004-09-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/001432 (2005-01-01), None
patent: WO 2005/003864 (2005-01-01), None
patent: WO 2005/006026 (2005-01-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/013008 (2005-02-01), None
patent: WO 2005/015283 (2005-02-01), None
patent: WO 2005/017625 (2005-02-01), None
patent: WO 2005/019935 (2005-03-01), None
patent: WO 2005/022266 (2005-03-01), None
patent: WO 2005/024325 (2005-03-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/034174 (2005-04-01), None
patent: WO 2005/050324 (2005-06-01), None
patent: WO 2005/054953 (2005-06-01), None
patent: WO 2005/054955 (2005-06-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
patent: WO 2005/059645 (2005-06-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/062128 (2005-07-01), None
patent: WO 2005/064400 (2005-07-01), None
patent: WO 2005/064405 (2005-07-01), None
patent: WO 2005/069055 (2005-07-01), None
patent: WO 2005/069078 (2005-07-01), None
patent: WO 2005/069081 (2005-07-01), None
patent: WO 2005/071491 (2005-08-01), None
patent: WO 2005/074606 (2005-08-01), None
patent: WO 2005/076084 (2005-08-01), None
patent: WO 2005/081030 (2005-09-01), None
patent: WO 2005/081067 (2005-09-01), None
Ulrich et al., “The Development of Dioptric Projection Lenses for DUV Lithography,” Proceedings of SPIE vol. 4832, pp. 158-169, 2002.
Chappel, Report—Trade press reprints on immersion lithography, “What Tech Will Win the NGL Race?,” “Intel Not Keen on Immersion” and “Significant Progress in Immersion Lithography Shown By Researchers at International Sematech-Sponsored Industriy-Wide Workshop,” pp. 1-6, Feb. 25, 2003.
Switkes et al., “Resolution enhancement of 157 nm lithography by liquid immersion,” Society of Photo-Optical Instrumentation Engineers, pp. 225-228, Oct. 2002.
Smith et al., “Water Immersion Optical Lithography for the 45nm Node,” Optical Microlithography XVI, Prcoceedings of SPIE vol. 5040, pp. 679-689, 2003.
Owen et al., “⅛ μm optical lithography,” J. Vac. Sci. Technol. B, vol. 10, No. 6, pp. 3032-3036, Nov./Dec. 1992.
Owa et al., “Immersion lithography; its potential performance and issues,” Proceedings of SPIE, vol. 5040, pp. 724-7

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