Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2008-04-01
2008-04-01
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S520000, C356S521000
Reexamination Certificate
active
10994314
ABSTRACT:
A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being rotatable around an optical axis of the target optical system, and an illumination optical system for introducing the measuring light into the barrel, the illumination optical system being movable along a direction perpendicular to the optical axis of the target optical system. The measuring apparatus controls an illumination area of the measuring light in the target optical system using a polar coordinate determined by a rotational angle of the barrel and a moving amount of the illumination optical system.
REFERENCES:
patent: 5291023 (1994-03-01), Hasegawa et al.
patent: 5313272 (1994-05-01), Nose et al.
patent: 5396335 (1995-03-01), Hasegawa et al.
patent: 5495336 (1996-02-01), Nose et al.
patent: 5717492 (1998-02-01), Sentoku et al.
patent: 5726758 (1998-03-01), Hasegawa et al.
patent: 5750294 (1998-05-01), Hasegawa et al.
patent: 5777744 (1998-07-01), Yoshii et al.
patent: 5834767 (1998-11-01), Hasegawa et al.
patent: 5969820 (1999-10-01), Yoshii et al.
patent: 6040909 (2000-03-01), Hasegawa et al.
patent: 6124601 (2000-09-01), Yoshii et al.
patent: 6266130 (2001-07-01), Hasegawa et al.
patent: 6307635 (2001-10-01), Goldberg
patent: 6573997 (2003-06-01), Goldberg et al.
patent: 6636311 (2003-10-01), Ina et al.
patent: 2004/0174533 (2004-09-01), Nakauchi
patent: 2005/0117168 (2005-06-01), Ouchi
patent: 2006/0187435 (2006-08-01), Ohsaki
patent: 102 60 985 (2004-05-01), None
patent: 2003-86501 (2003-03-01), None
patent: WO 02/12826 (2002-02-01), None
Lee, S. H., et al., “Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization,”J. Vac. Sci. Technol., B 18(6), Nov./Dec. 2000. pp. 2935-2938.
Naulieau, P. P., et al., “Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system,”J. Vac. Sci. Technol. B 18(6), Nov./Dec. 2000. pp. 2939-2943.
European Search Report dated Mar. 8, 2007, mailed in a Communication dated Mar. 20, 2007, in copending European patent application No. 04 02 8148.
Canon Kabushiki Kaisha
Chowdhury Tarifur
Fitzpatrick ,Cella, Harper & Scinto
Hansen Jonathan M
LandOfFree
Measuring method and apparatus using shearing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Measuring method and apparatus using shearing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring method and apparatus using shearing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3955428