Projection optical system and projection exposure apparatus usin

Details Projection optical system and projection exposure apparatus usin Projection optical system and projection exposure apparatus usin

1995-06-27

1997-06-03

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, 355 55, H01L 21027

Patent

active

056360002

ABSTRACT:
A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.

REFERENCES:
patent: 5025284 (1991-06-01), Komoriya et al.
patent: 5137349 (1992-08-01), Tanigucho et al.
patent: 5170207 (1992-12-01), Tezuka et al.
patent: 5270771 (1993-12-01), Sato
Miyaji et al., "Excimer lithography for ULSI", Optical and Quantum Electronics 25 (1993), pp. 297-310.
Nishida, "Achromatic Lens by Combining Diffraction Grating and Refractive Lenses", Shashin Kogyo, Mar. 1994.

Affiliated with

Also associated with

Rating

Projection optical system and projection exposure apparatus usin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection optical system and projection exposure apparatus usin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection optical system and projection exposure apparatus usin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-395065