Compositions – Etching or brightening compositions
Reexamination Certificate
2008-09-23
2008-09-23
Goudreau, George A. (Department: 1792)
Compositions
Etching or brightening compositions
C252S079200, C252S079300, C252S079400
Reexamination Certificate
active
11044769
ABSTRACT:
The polishing solution is useful for removing barrier materials in the presence of at least one nonferrous interconnect metal with limited erosion of dielectrics. The polishing solution contains 0 to 20 weight percent oxidizer, at least 0.001 weight percent inhibitor for reducing removal rate of the nonferrous interconnect metals, 0.0005 to 5 weight percent of at least one nonferrous accelerator selected from the group of a complexing agent for complexing the nonferrous metal and a water-soluble polymer containing an acrylic acid functional group and having a number average molecular weight of 100 to 1,000,000, 0 to 50 weight percent abrasive and balance water at a pH less than 7.
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Biederman Blake T.
Goudreau George A.
Rohm and Haas Electronic Materials CMP Holdings Inc.
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