Photomask for uniform intensity exposure to an optical...

Details Photomask for uniform intensity exposure to an optical... Photomask for uniform intensity exposure to an optical...

2008-05-20

2008-05-20

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10842451

ABSTRACT:
A photomask including a light-transmissible base member; and a light-blocking film provided thereon. The film has a micro-aperture adapted to expose an object to near-field light seeping out from the micro-aperture. The photomask further includes a periodic structure with a pitch and a phase comprising recesses or projections so as to make uniform an intensity distribution of the optical near-field in the micro-aperture and directly under the micro-aperture on the object.

REFERENCES:
patent: 6171730 (2001-01-01), Kuroda et al.
patent: 6187482 (2001-02-01), Kuroda et al.
patent: 6236033 (2001-05-01), Ebbesen et al.
patent: 6285020 (2001-09-01), Kim et al.
patent: 6628392 (2003-09-01), Kuroda et al.
patent: 6720115 (2004-04-01), Inao et al.
patent: 2001/0036581 (2001-11-01), Inao et al.
patent: 2002/0196420 (2002-12-01), Naya
patent: 2003/0211403 (2003-11-01), Mizutani et al.
patent: 2003/0232257 (2003-12-01), Inao et al.
patent: 2006/0003236 (2006-01-01), Mizutani et al.
Weast et al., CRC Handbook of Chemistry and Physics, CRC Press, Inc., 61st Ed., 1980, pp. E-392, E-393.

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