Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2008-03-11

2008-03-11

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

11548021

ABSTRACT:
An exposure apparatus to expose a substrate to light with a space between a projection optical system and the substrate filled with liquid. The apparatus has a stage to hold the substrate and to move, a supply unit to supply the liquid to the space, a recovery unit to recover the liquid from the space, a detector to detect a droplet of the liquid on at least one of the substrate and the stage, a removing unit configured to remove the droplet on the substrate detected by the detector, the removing unit including a slit-shaped nozzle arranged so as to vertically sandwich the substrate and blowing a gas on the substrate from the nozzle, a calculation unit to calculate at least one of a position and size of the droplet detected by the detector, and a controller to control a relative velocity between the nozzle and the substrate based on the calculation result of the calculation unit.

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patent: 6762821 (2004-07-01), Kamono
patent: 2002/0011207 (2002-01-01), Uzawa et al.
patent: 2005/0048220 (2005-03-01), Mertens et al.
patent: 2005/0225735 (2005-10-01), Magome et al.
patent: 2005/0275998 (2005-12-01), Kamono
patent: 2006/0257553 (2006-11-01), Ohta et al.
patent: 2007/0081135 (2007-04-01), Kamono
patent: 6-124873 (1994-05-01), None
patent: 2002-057100 (2002-02-01), None
patent: WO 99/49504 (1999-09-01), None

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