Exposure apparatus and device fabrication method

Details Exposure apparatus and device fabrication method Exposure apparatus and device fabrication method

2008-01-15

2008-01-15

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S075000

Reexamination Certificate

active

10871210

ABSTRACT:
In order to improve a responsiveness of the radiation cooling and to switch a cooling position, an exposure apparatus for exposing an object includes a cooling mechanism for radiation-cooling the object, and a regulator for regulating a radiant heat transfer amount between said cooling mechanism and the object.

REFERENCES:
patent: 5884009 (1999-03-01), Okase
patent: 6020950 (2000-02-01), Shiraishi
patent: 6084938 (2000-07-01), Hara et al.
patent: 6463119 (2002-10-01), Terashima et al.
patent: 6509951 (2003-01-01), Loopstra et al.
patent: 6514073 (2003-02-01), Toshima et al.
patent: 6954258 (2005-10-01), Emoto
patent: 6992306 (2006-01-01), Honda et al.
patent: 2003/0012009 (2003-01-01), Suzuki et al.
patent: 2003/0031017 (2003-02-01), Tsuji
patent: 1 280 008 (2003-01-01), None
patent: 09-306834 (1997-11-01), None
patent: 11-54496 (1999-02-01), None
patent: 2003-31017 (2003-01-01), None
patent: 2003-45774 (2003-02-01), None
patent: 2003-58258 (2003-02-01), None

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