Foreign matter removing mechanism, fluid flow processing...

Details Foreign matter removing mechanism, fluid flow processing... Foreign matter removing mechanism, fluid flow processing...

2008-04-29

2008-04-29

Upton, Christopher (Department: 1797)

Liquid purification or separation

Processes

Separating

C210S519000, C210S521000, C210S533000, C210S538000

Reexamination Certificate

active

10484631

ABSTRACT:
The present processing apparatus blocks off such a portion of a flow of a plating solution (17) that is other than a vicinity of a liquid surface, by using a first partition plate (15) whose lower end is in close contact with a bottom of a plating tank (11) and whose upper end is at a position lower than a liquid surface. Therefore, the plating solution (17) flowing at the bottom of the plating tank (11) flows upwards along the first partition plate (15). At this time, heavy foreign substances do not tend to follow such an upward movement of the plating solution (17), and therefore sink and accumulate in a vicinity of the lower end of the first partition plate (15), so as not to flow into a downstream side of the plate. With this arrangement, the present processing apparatus can remove the heavy foreign substances from the plating solution (17) without relying solely on a filter of a circulation pipe (10).

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