Method of fabricating a probe having a field effect...

Details Method of fabricating a probe having a field effect... Method of fabricating a probe having a field effect...

Filed on

2008-07-22

Date issued

2008-07-22

Examiner

Vanore, David A. (Department: 2881)

Patent Class

Nanotechnology

SubClass

Manufacture, treatment, or detection of nanostructure

SubSubClass

With scanning probe

Other Related Categories

C977S876000, C977S849000, C977S850000, C977S855000, C977S860000, C977S861000, C977S862000, C977S863000, C977S864000, C250S306000, C250S310000, C438S056000, C438S083000, C438S100000, C438S142000, C257S213000, C423S414000, C423S44500R

Type

Reexamination Certificate

Status

active

Patent number

11317603

Description

ABSTRACT:
A probe of a scanning probe microscope having a sharp tip and an increased electric characteristic by fabricating a planar type of field effect transistor and manufacturing a conductive carbon nanotube on the planar type field effect transistor. To achieve this, the present invention provides a method for fabricating a probe having a field effect transistor channel structure including fabricating a field effect transistor, making preparations for growing a carbon nanotube at a top portion of a gate electrode of the field effect transistor, and generating the carbon nanotube at the top portion of the gate electrode of the field effect transistor.

REFERENCES:
patent: 5610424 (1997-03-01), Park
patent: 6146227 (2000-11-01), Mancevski
patent: 6159742 (2000-12-01), Lieber et al.
patent: 6346189 (2002-02-01), Dai et al.
patent: 6472705 (2002-10-01), Bethune et al.
patent: 6477132 (2002-11-01), Azuma et al.
patent: 6521921 (2003-02-01), Lim et al.
patent: 6590231 (2003-07-01), Watanabe et al.
patent: 6780664 (2004-08-01), Goruganthu et al.
patent: 6919063 (2005-07-01), Jang et al.
patent: 6942921 (2005-09-01), Rueckes et al.
patent: 6986876 (2006-01-01), Smalley et al.
patent: 7056455 (2006-06-01), Matyjaszewski et al.
patent: 7056758 (2006-06-01), Segal et al.
patent: 7098151 (2006-08-01), Moriya et al.
patent: 7105428 (2006-09-01), Pan et al.
patent: 2003/0205457 (2003-11-01), Choi et al.
patent: 2005/0026531 (2005-02-01), Ohnuma
patent: 2005/0081983 (2005-04-01), Nakayama et al.
patent: 2006/0038299 (2006-02-01), Hirakata et al.
patent: 2006/0104886 (2006-05-01), Wilson
patent: 2006/0118777 (2006-06-01), Hirakata et al.
patent: 2006/0205105 (2006-09-01), Maruyama et al.
patent: 2006/0230475 (2006-10-01), Moon et al.
patent: 2006/0237708 (2006-10-01), Choi et al.
patent: 2007/0021293 (2007-01-01), Furukawa et al.
patent: 2007/0023839 (2007-02-01), Furukawa et al.
patent: 2007/0155065 (2007-07-01), Borkar et al.
patent: 2000-067478 (2000-03-01), None
patent: 2001-45981 (2001-02-01), None
patent: 2003-87371 (2003-03-01), None
patent: 10-2004-0096530 (2004-11-01), None

Affiliated with

Also associated with

Rating

Method of fabricating a probe having a field effect... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a probe having a field effect..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a probe having a field effect... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3933258