Solvent removal apparatus and method

Drying and gas or vapor contact with solids – Process – With nondrying treating of material

Reexamination Certificate

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Details

C034S080000

Reexamination Certificate

active

11312970

ABSTRACT:
A solvent removal apparatus and method is provided that can dry a coat on a workpiece in a uniform thickness. The solvent removal apparatus includes a support base for supporting a substrate provided with a liquid phase film-forming coat containing a film material and a solvent, a gas introduction mechanism for introducing a solvent removal gas toward a center part of the substrate, and a flow restrictor for restricting flow of the solvent removal gas in such a manner that the gas can flow radially outward from the center part of the substrate toward a peripheral edge part thereof. The solvent is removed from the coat while restricting the flow of the gas with the flow restrictor.

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patent: 4510176 (1985-04-01), Cuthbert et al.
patent: 4790262 (1988-12-01), Nakayama et al.
patent: 5803970 (1998-09-01), Tateyama et al.
patent: 5952050 (1999-09-01), Doan
patent: 07-111232 (1995-04-01), None
patent: 08-194316 (1996-07-01), None
patent: 2000-124106 (2000-04-01), None
patent: 2003-262464 (2003-09-01), None
patent: 2003-275668 (2003-09-01), None

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