Lithographic apparatus, radiation system and filter system

Details Lithographic apparatus, radiation system and filter system Lithographic apparatus, radiation system and filter system

2008-04-29

2008-04-29

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C355S067000

Reexamination Certificate

active

11317242

ABSTRACT:
A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a second set of foils for trapping the debris particles, and a first heat sink and a second heat sink. Each foil of the first set is thermally connected to the first heat sink, and each foil of the second set is thermally connected to the second heat sink, so that heat is conducted substantially towards the first heat sink through each foil of the first set, and heat is conducted substantially towards the second heat sink through each foil of the second set. The first set extend substantially in a first section of the predetermined cross-section, and the second set extend substantially in a second section of the predetermined cross-section. The first and second sections are substantially non-overlapping.

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