Method and apparatus for patterning a workpiece

Details Method and apparatus for patterning a workpiece Method and apparatus for patterning a workpiece

2008-07-29

2008-07-29

Berman, Jack (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492230, C250S365000, C250S461100, C324S12100R, C359S290000, C359S291000, C359S292000, C359S285000, C359S286000, C347S239000, C347S255000, C347S233000, C438S026000, C438S011000, C438S025000, C430S030000, C430S302000, C430S312000, C430S005000, C430S311000, C356S138000, C356S614000, C716S030000, C716S030000

Reexamination Certificate

active

10498713

ABSTRACT:
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arranged in said computer controlled reticle according to a digital description. An image of said computer controlled reticle is created on said workpiece, wherein said pixels in said computer controlled reticle are arranged in alternate states along at least a part of one feature edge in order to create a smaller address grid. The invention also relates to an apparatus for creating a pattern on a workpiece. The invention also relates to a semiconducting wafer and a mask.

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