Standard member for length measurement, method for producing...

Radiant energy – Calibration or standardization methods

Reexamination Certificate

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C250S306000, C250S307000, C250S310000, C250S311000

Reexamination Certificate

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10544668

ABSTRACT:
This invention provides an electron beam length measuring technology including a standard component for length measurement that has a finer standard dimension, and its producing method. The standard component for length measurement has a semiconductor member on which is arranged a pattern consisting of an array of first diffraction gratings whose pitch dimension is specified as an absolute dimension by an optical measurement method, wherein the pattern has a structure in which an array of second diffraction gratings different from the first diffraction gratings is arranged in a portion within the array of the first diffraction gratings in a predetermined cycle. Each one of the first diffraction gratings and the second diffraction gratings has a predetermined length and a predetermined width, respectively. The first diffraction gratings and the second diffraction gratings are arranged cyclically at respective predetermined intervals, and marks for specifying positions of the above-mentioned patterns are arranged in peripheral portions of the above-mentioned patterns. Moreover, the above-mentioned pattern contains an array pattern whose minimum pitch dimension is equal to or less than 100 nm. The electron beam batch exposure method is used as a pattern producing method.

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