Means to establish orientation of ion beam to wafer and...

Details Means to establish orientation of ion beam to wafer and... Means to establish orientation of ion beam to wafer and...

2008-04-22

2008-04-22

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S39600R, C250S397000, C250S492200, C250S398000, C250S492300

Reexamination Certificate

active

11290344

ABSTRACT:
One or more aspects of the present invention pertain to a measurement component that facilitates determining a relative orientation between an ion beam and a workpiece. The measurement component is sensitive to ion radiation and allows a relative orientation between the measurement component and the ion beam to be accurately determined by moving the measurement component relative to the ion beam. The measurement component is oriented at a known relationship relative to the workpiece so that a relative orientation between the workpiece and beam can be established. Knowing the relative orientation between the ion beam and workpiece allows the workpiece to be oriented to a specific angle relative to the measured beam angle for more accurate and precise doping of the workpiece, which enhances semiconductor fabrication.

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International Search Report, Int'l Application No. PCT/US2006/044891, Int'l Filing Data Nov. 17, 2006, 3 pgs.

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