Dry-developing photosensitive dry film resist

Details Dry-developing photosensitive dry film resist Dry-developing photosensitive dry film resist

1980-04-28

1981-09-15

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Image layer portion transfer and element therefor

430281, 430314, 430323, 430324, 430496, 430905, 430907, 430908, G03C 1112, G03C 168

Patent

active

042898412

ABSTRACT:
A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.

REFERENCES:
patent: 3202508 (1965-08-01), Heiart
patent: 3264103 (1966-08-01), Cohen et al.
patent: 3353955 (1967-11-01), Colgrove
patent: 3469982 (1969-09-01), Celeste
patent: 3607264 (1971-09-01), Celeste
patent: 3770438 (1973-11-01), Celeste
patent: 4058443 (1977-11-01), Murata et al.
patent: 4127436 (1978-11-01), Friel

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