Diazo-unsaturated monomer light sensitive compositions

Details Diazo-unsaturated monomer light sensitive compositions Diazo-unsaturated monomer light sensitive compositions

1980-08-13

1981-09-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430176, 430171, 430192, 430197, 430284, 430906, 430325, 430326, 430302, G03C 160, G03C 154, G03F 708

Patent

active

042898382

ABSTRACT:
Improved compositions comprising solvent-soluble, negative-acting or positive-acting light-sensitive diazonium compounds and solvent-soluble unsaturated monomers which are the products of about two equivalents of an organic diisocyanate with about one equivalent of an active hydrogen-containing organic compound, e.g., an alcohol or amine, preferably a polyol, which products are subsequently reacted with an unsaturated compound which contains an active-hydrogen, preferably in a hydroxyl group, available to react with the remaining isocyanate groups. The compositions can be coated onto suitable base sheet materials to form presensitized lithographic printing plates, proofs for multi-color printing, visual aids, printed circuits and the like.

REFERENCES:
patent: 3208850 (1965-09-01), Daech
patent: 3396019 (1968-08-01), Uhlig
patent: 3552962 (1971-01-01), Notley
patent: 3652272 (1972-03-01), Thomas
patent: 3655625 (1972-04-01), Thomas
patent: 3660097 (1972-05-01), Mainthia
patent: 3732105 (1973-05-01), Klupfel et al.
patent: 3840390 (1974-10-01), Kozu et al.
patent: 3850770 (1974-11-01), Juna et al.
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 175-180.

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