Optical: systems and elements – Optical modulator – Light wave directional modulation
Reexamination Certificate
2008-04-29
2008-04-29
Choi, William C (Department: 2873)
Optical: systems and elements
Optical modulator
Light wave directional modulation
C359S290000, C430S311000
Reexamination Certificate
active
11314413
ABSTRACT:
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
REFERENCES:
patent: 4566935 (1986-01-01), Hornbeck
patent: 5073010 (1991-12-01), Johnson et al.
patent: 5148157 (1992-09-01), Florence
patent: 5171965 (1992-12-01), Suzuki et al.
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5497258 (1996-03-01), Ju et al.
patent: 5504504 (1996-04-01), Markandey et al.
patent: 5508841 (1996-04-01), Lin et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5539567 (1996-07-01), Lin et al.
patent: 5539568 (1996-07-01), Lin et al.
patent: 5835256 (1998-11-01), Huibers
patent: 5929977 (1999-07-01), Ozawa
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6268906 (2001-07-01), Suzuki
patent: 6285488 (2001-09-01), Sandstrom
patent: 6312134 (2001-11-01), Jain et al.
patent: 6373619 (2002-04-01), Sandstrom
patent: 6428940 (2002-08-01), Sandstrom
patent: 6489984 (2002-12-01), Johnson
patent: 6504644 (2003-01-01), Sandstrom
patent: 7009753 (2006-03-01), Sandstrom
patent: 0467076 (1992-01-01), None
patent: WO 9309469 (1993-05-01), None
patent: WO 9804950 (1998-02-01), None
patent: WO 9922262 (1999-05-01), None
patent: WO 9945439 (1999-09-01), None
patent: WO 9945441 (1999-09-01), None
patent: WO 0042618 (2000-07-01), None
H. Kuck et al., New System for fast submicron laser direct writing, SPIE vol. 2440, pp. 506-514.
P.M. Hagelin et al., Micromachining and microfabrication technology for adaptive optics, os Sep. 16, 1999.
Choi William C
Harness & Dickey & Pierce P.L.C.
Micronic Laser Systems AB
LandOfFree
Pattern generator does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern generator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern generator will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3913786