Method and apparatus for an improved baffle plate in a...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With etchant gas supply or exhaust structure located outside...

Reexamination Certificate

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C118S715000, C204S298070

Reexamination Certificate

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11010373

ABSTRACT:
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.

REFERENCES:
patent: 4310390 (1982-01-01), Bradley et al.
patent: 4357387 (1982-11-01), George et al.
patent: 4469619 (1984-09-01), Ohno et al.
patent: 4593007 (1986-06-01), Novinski
patent: 4612077 (1986-09-01), Tracy et al.
patent: 4649858 (1987-03-01), Sakai et al.
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4877757 (1989-10-01), York et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5334462 (1994-08-01), Vine et al.
patent: 5362335 (1994-11-01), Rungta
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5367838 (1994-11-01), Visaisouk et al.
patent: 5423936 (1995-06-01), Tomita et al.
patent: 5426310 (1995-06-01), Tamada et al.
patent: 5484752 (1996-01-01), Waku et al.
patent: 5494713 (1996-02-01), Ootuki
patent: 5521790 (1996-05-01), Ruckel et al.
patent: 5551190 (1996-09-01), Yamagishi et al.
patent: 5556501 (1996-09-01), Collins et al.
patent: 5614055 (1997-03-01), Fairbairn et al.
patent: 5637237 (1997-06-01), Oehrlein et al.
patent: 5641375 (1997-06-01), Nitescu et al.
patent: 5651723 (1997-07-01), Bjornard et al.
patent: 5680013 (1997-10-01), Dornfest et al.
patent: 5725960 (1998-03-01), Konishi et al.
patent: 5759360 (1998-06-01), Ngan et al.
patent: 5798016 (1998-08-01), Oehrlein et al.
patent: 5834070 (1998-11-01), Movchan et al.
patent: 5851343 (1998-12-01), Hsu et al.
patent: 5868848 (1999-02-01), Tsukamoto
patent: 5879575 (1999-03-01), Tepman et al.
patent: 5885356 (1999-03-01), Zhao et al.
patent: 5885402 (1999-03-01), Esquibel
patent: 5891253 (1999-04-01), Wong et al.
patent: 5892278 (1999-04-01), Horita
patent: 5894887 (1999-04-01), Kelsey et al.
patent: 5895586 (1999-04-01), Kaji et al.
patent: 5900064 (1999-05-01), Kholodenko
patent: 5902763 (1999-05-01), Waku et al.
patent: 5911852 (1999-06-01), Katayama et al.
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5925228 (1999-07-01), Panitz
patent: 5944902 (1999-08-01), Redeker et al.
patent: 5948521 (1999-09-01), Dlugosch et al.
patent: 5952054 (1999-09-01), Sato et al.
patent: 5952060 (1999-09-01), Ravi
patent: 5955182 (1999-09-01), Yasuda et al.
patent: 5968377 (1999-10-01), Yuasa et al.
patent: 5985102 (1999-11-01), Leiphart
patent: 5994662 (1999-11-01), Murugesh
patent: 6068729 (2000-05-01), Shrotriya
patent: 6073449 (2000-06-01), Watanabe et al.
patent: 6096161 (2000-08-01), Kim et al.
patent: 6106625 (2000-08-01), Koai et al.
patent: 6110287 (2000-08-01), Arai et al.
patent: 6120640 (2000-09-01), Shih et al.
patent: 6120955 (2000-09-01), Tokutake et al.
patent: 6123791 (2000-09-01), Han et al.
patent: 6123804 (2000-09-01), Babassi et al.
patent: 6129808 (2000-10-01), Wicker et al.
patent: 6139983 (2000-10-01), Ohashi et al.
patent: 6143646 (2000-11-01), Wetzel
patent: 6170429 (2001-01-01), Schoepp et al.
patent: 6176969 (2001-01-01), Park et al.
patent: 6182603 (2001-02-01), Shang et al.
patent: 6210486 (2001-04-01), Mizukami et al.
patent: 6221202 (2001-04-01), Walko, II
patent: 6246479 (2001-06-01), Jung et al.
patent: 6264788 (2001-07-01), Tomoyasu et al.
patent: 6265757 (2001-07-01), Brady et al.
patent: 6266133 (2001-07-01), Miyajima et al.
patent: 6296740 (2001-10-01), Xie et al.
patent: 6335293 (2002-01-01), Luo et al.
patent: 6364949 (2002-04-01), Or et al.
patent: 6368987 (2002-04-01), Kopacz et al.
patent: 6373573 (2002-04-01), Jung et al.
patent: 6383333 (2002-05-01), Haino et al.
patent: 6383964 (2002-05-01), Nakahara et al.
patent: 6394026 (2002-05-01), Wicker et al.
patent: 6413578 (2002-07-01), Stowell et al.
patent: 6444083 (2002-09-01), Steger et al.
patent: 6514377 (2003-02-01), Morimoto
patent: 6519037 (2003-02-01), Jung et al.
patent: 6527911 (2003-03-01), Yen et al.
patent: 6533910 (2003-03-01), O'Donnell et al.
patent: 6537429 (2003-03-01), O'Donnell et al.
patent: 6544380 (2003-04-01), Tomoyasu et al.
patent: 6554906 (2003-04-01), Kuibira et al.
patent: 6562186 (2003-05-01), Saito et al.
patent: 6570654 (2003-05-01), Jung et al.
patent: 6583064 (2003-06-01), Wicker et al.
patent: 6590660 (2003-07-01), Jung et al.
patent: 6613204 (2003-09-01), Xie et al.
patent: 6613442 (2003-09-01), O'Donnell et al.
patent: 6641697 (2003-11-01), Han et al.
patent: 6663714 (2003-12-01), Mizuno et al.
patent: 6695929 (2004-02-01), Kanekiyo et al.
patent: 6726801 (2004-04-01), Ahn
patent: 6733620 (2004-05-01), Sugiyama et al.
patent: 6738862 (2004-05-01), Ross et al.
patent: 6776873 (2004-08-01), Sun et al.
patent: 6783863 (2004-08-01), Harada et al.
patent: 6783875 (2004-08-01), Yamada et al.
patent: 6798519 (2004-09-01), Nishimoto et al.
patent: 6805952 (2004-10-01), Chang et al.
patent: 6806949 (2004-10-01), Ludviksson et al.
patent: 6811651 (2004-11-01), Long
patent: 6830622 (2004-12-01), O'Donnell et al.
patent: 6833279 (2004-12-01), Choi
patent: 6837966 (2005-01-01), Nishimoto et al.
patent: 6852433 (2005-02-01), Maeda
patent: 6863594 (2005-03-01), Preising
patent: 6875477 (2005-04-01), Trickett et al.
patent: 6884516 (2005-04-01), Harada et al.
patent: 6894769 (2005-05-01), Ludviksson et al.
patent: 6896785 (2005-05-01), Shatrov et al.
patent: 2001/0003271 (2001-06-01), Otsuki
patent: 2001/0050144 (2001-12-01), Nishikawa et al.
patent: 2002/0076508 (2002-06-01), Chiang et al.
patent: 2002/0086118 (2002-07-01), Chang et al.
patent: 2002/0086501 (2002-07-01), O'Donnell et al.
patent: 2002/0086545 (2002-07-01), O'Donnell et al.
patent: 2002/0086553 (2002-07-01), O'Donnell et al.
patent: 2002/0090464 (2002-07-01), Jiang et al.
patent: 2002/0142611 (2002-10-01), O'Donnell et al.
patent: 2002/0177001 (2002-11-01), Harada et al.
patent: 2003/0010446 (2003-01-01), Kajiyama et al.
patent: 2003/0029563 (2003-02-01), Kaushal et al.
patent: 2003/0084848 (2003-05-01), Long
patent: 2003/0113479 (2003-06-01), Fakuda et al.
patent: 2003/0150419 (2003-08-01), Daragheh et al.
patent: 2003/0200929 (2003-10-01), Otsuki
patent: 2004/0026372 (2004-02-01), Takenaka et al.
patent: 2004/0035364 (2004-02-01), Tomoyoshi et al.
patent: 2004/0050495 (2004-03-01), Sumiya et al.
patent: 2004/0060516 (2004-04-01), Nishimoto et al.
patent: 2004/0060656 (2004-04-01), Saigusa et al.
patent: 2004/0060657 (2004-04-01), Saigusa et al.
patent: 2004/0060658 (2004-04-01), Nishimoto et al.
patent: 2004/0060661 (2004-04-01), Nishimoto et al.
patent: 2004/0060779 (2004-04-01), Kreger
patent: 2004/0061447 (2004-04-01), Saigusa et al.
patent: 2004/0063333 (2004-04-01), Saigusa et al.
patent: 2004/0072426 (2004-04-01), Jung
patent: 2004/0081746 (2004-04-01), Imafuku
patent: 2004/0083970 (2004-05-01), Imafuku et al.
patent: 2004/0125359 (2004-07-01), Ludviksson et al.
patent: 2004/0168640 (2004-09-01), Muto et al.
patent: 2004/0173155 (2004-09-01), Nishimoto et al.
patent: 2005/0103268 (2005-05-01), Nishimoto et al.
patent: 2005/0103275 (2005-05-01), Sasaki et al.
patent: 2005/0150866 (2005-07-01), O'Donnell
patent: 2006/0134919 (2006-06-01), Hamelin et al.
patent: 94 21 671 (1996-07-01), None
patent: 0 508 731 (1992-10-01), None
patent: 0 573 057 (1993-12-01), None
patent: 0 799 904 (1997-10-01), None
patent: 0 814 495 (1997-12-01), None
patent: 0 841 838 (1998-05-01), None
patent: 1 069 603 (2001-01-01), None
patent: 1 081 749 (2001-03-01), None
patent: 1 156 130 (2001-11-01), None
patent: 2 252 567 (1992-08-01), None
patent: 61-207566 (1986-09-01), None
patent: 64-039728 (1989-02-01), None
patent: 01-312087 (1989-12-01), None
patent: 1-312087 (1989-12-01), None
patent: 02-267967 (1990-11-01), None
patent: 03-115535 (1991-05-01), None
patent: 04-238882 (1992-08-01), None
patent: H4-238882 (1992-08-01), None
patent: 05-070922 (1993-03-01), None
patent: 05-117064 (1993-05-01), None
patent: 05-121360 (1993-05-01), None
patent: 05-198532 (1993-08-01), None
patent: 05-238859 (1993-09-01), None
patent: 06-057396 (1994-03-01), None
patent: 06-136505 (1994-05-01), None
patent: 06-142822 (1994-05-01), None
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