Method and apparatus for scanning a workpiece in a vacuum...

Details Method and apparatus for scanning a workpiece in a vacuum... Method and apparatus for scanning a workpiece in a vacuum...

2007-10-02

2007-10-02

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S442110, C250S281000, C250S287000

Reexamination Certificate

active

11173494

ABSTRACT:
An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and an implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of an implantation surface of the workpiece by the ion beam. The implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece within an interior region of the implantation chamber, the workpiece support structure. The workpiece support structure includes a rotation member coupled to the implantation chamber for changing an implantation angle of the workpiece with respect to a portion of the ion beam within the implantation chamber. The workpiece support structure also includes a translation member movably coupled to the rotation member and supporting the workpiece for movement along a path of travel wherein at least some components of the translation member components are disposed within a reduced pressure translation member chamber. The translation member chamber is isolated from the implantation chamber interior region by a dynamic seal. A workpiece holder support arm of the translation member extends through the dynamic seal and into the implantation chamber.

REFERENCES:
patent: 4761559 (1988-08-01), Myron
patent: 4975586 (1990-12-01), Ray
patent: 6710360 (2004-05-01), Ferrara

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