Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-06
2007-02-06
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000
Reexamination Certificate
active
10728436
ABSTRACT:
Aspects of the present invention provide for a novel photomask for patterning features for an integrated circuit, the photomask including masked features having interior nonprinting windows. In some embodiments, the interior nonprinting window is an alternating phase shifter, while the area surrounding the masked features transmits light unshifted. In other embodiments, the interior nonprinting window transmits light unshifted, while the area surrounding the masked features is an alternating phase shifter. Thus any arrangement of features can be patterned with no phase conflict.
REFERENCES:
patent: 6057063 (2000-05-01), Liebmann et al.
patent: 6523165 (2003-02-01), Liu et al.
patent: 6541165 (2003-04-01), Pierrat
patent: 6551750 (2003-04-01), Pierrat
patent: 6569583 (2003-05-01), Cho et al.
patent: 6934007 (2005-08-01), Fritze et al.
patent: 2002/0028541 (2002-03-01), Lee et al.
patent: 2003/0022074 (2003-01-01), Nolscher
Bernard, Douglas.A. ,et al. , “Clear Field Dual Alternating Phase Shift Mask Lithography”,Optical Microlithography XV, SPIEvol. 4691, (2002),999-1008.
Burkhardt, M.,et al. , “Through Pitch Correction of Scattering Effects in 193 nm Alternating Phase Shift Masks”,Optical Microlithography XVvol. 4691, No. I,SPIE, (2002),348-358.
Cha, Han-Sun.,et al. , “A Study on Optimization of Alternating Phase Shifting Mask Structure”,21st Annual BACUS Symposium on Photomask Technology, SPIEvol. 4562, No. II, (2002),1008-1016.
Ferguson, Richard.A. , “Pattern-Dependent Correction of Mask Topography Effects for Alternating Phase-Shifting Masks”,SPIEvol. 2440, (2/95),349-360.
Griesinger, Uwe.,et al. , “Balancing of Alternating Phase Shifting Masks for Practical Application: Modeling and Experimental Verification”,Proc. of SPIE, vol. 4186, (2001),372-383.
Griesinger, Uwe.,et al. , “Transmission & Phase Balancing of alternating Phase Shifting Masks (5X)- Theoretical & Experimental Result”,19th Annual Symposium on Photomask Technologyvol. 3873, No. 1,SPIE, Published in: Monterey, US,(1999),359-369.
Irie, Shigeo., “Sub-70-nm Pattern Fabrication using an Alternating Phase Shifting Mask in 157-nm Lithography”,Optical Microlithography XV, SPIE, vol. 4691, (2002),1654-1664.
Kang, Myung-Ah., “Feasibility evaluations of alternating phase shift mask for imaging sub-80nm feature with KrF”,Optical Microlithography XVI, SPIEvol. 5040, (2003),1115-1124.
Kim, Keeho.,et al. , “Optimization of Process Condition to Balance MEF and OPC for Alternating PSM-Control of Forbidden Pitches”,Optical Microlithography XV, vol. 4691, No. I,SPIE, (2002),240-246.
Koo, Sang-Sool.,et al. , “Study on the Potentialities of sub-100nm Optical Lithography of Alternating and Phase-edge Phase Shift Mask for ArF Lithography”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),346-358.
Kostelak, R.L. ,et al. , “Exposure Characteristics of Alternate Aperture Phase-Shifting Masks Fabricated using a Subtractive Process”,J. Vac. Sci. Tech. B, vol. 10(6), (Nov./Dec. 1992),3055-3061.
Levensen, M.D. ,et al. , “Phase Phirst! An Improved Strong-PSM Paradigm”,Proc. os SPIE, vol. 4186, (2001),395-404.
Lin, Chih-Cheng.,et al. , “Alternating PSM defect printability at 193-nm wavelength”,21st Annual BACUS Symposium on Photomask Technologyvol. 4562, No. II,SPIE, (2002),1121-1125.
Maurer, Wilhelm.,et al. , “Proximity Effects of Alternating Phase Shift Masks”,19th Annual Symposium on Photomask Technology, vol. 3873, No. I,SPIE, Sep. 1999,344-349.
Misaka, Akio.,et al. , “Improved outline phase shifting mask for reduction of the mask error enhancement factor”,Optical Microlithography XVI, Proceedings of SPIE, vol. 5040, (2003),1220-1230.
Murai, Shiaki.,et al. , “Establishment of Production Process and Assurance Method for Alternating Phase Shift Masks”,20th Annual BACUS Symposium on Photomask Technology,SPIEvol. 4186, (2001),890-901.
Petersen, John.S. ,et al. , “Designing Dual-Trench Alternating Phase-Shift Masks for 140 NM and Smaller Features Using 248 NM KRF and 193 NM ARF Lithography”,Proc. of SPIE, vol. 3412, (1998),503-520.
Pierrat, C., “Investigation of Proximity Effects in Alternating Aperture Phase Shifting Masks”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),325-335.
Pierrat, Christophe.,et al. , “New alternating phase-shifting mask conversion methodology using phase conflict resolution”,Optical Microlithography XV, vol. 4691, No. I,SPIE, (2002),325-335.
Saitou, Hidetaka.,et al. , “Improvement of Alt-PSM Production Process Using Backside Phase Measurement Method”,21st Annual BACUS Symposium on Photomask Technologyvol. 4562, No. II,SPIE,(2002),1087-1095.
Shin, In-Gyun.,et al. , “A Study on the effect of mask reduction ratio in alternating phase shift masks”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),309-315.
Spence, Christopher.,et al. , “Integration of Optical Proximity Correction Strategies in Strong Phase Shifters Design for Poly-Gate Layers”,19th Annual Symposium on Photomask Technology, vol. 3873, No. ISPIE, (Sep. 1999),277-287.
Tan, Sia.K. , “Optimization of Alternating PSM Mask Process for 65 nm Poly Gate Patterning Using 193 nm Lithography”,Optical Microlithography XVI, SPIEvol. 5040 (2003),1125-1136.
Thiele, Jorg.,et al. , “Introduction of full level alternating phase shift mask technology into IC manufacturing”,Optical Microlithography XV, vol. 4691, No. I,SPIE, (2002),89-97.
Tsai, W.,et al. , “Technological Challenges in Implementation of Alternating Phase Shift Mask”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),433-443.
Westerman, R.,et al. , “Plasma Etching of Quartz for the Fabrication of Alternating Aperture Phase Shift Photomasks: Etch Rate Uniformity Study”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),316-324.
Wu, Clive., “Alternating PSM Design and Its Implications to the Design-to-Manufacturing Flow”, ?, Numerical Technologies, Inc. 70 W. Plumeria Dr., San Jose, CA 95134,7 pgs.
Yamamoto, Tomohiki.,et al. , “Impact of Alternating Phase Shift Mask Quality on 100 nm Gate Lithography”,20th Annual BACUS Symposium on Photomask Technology, vol. 4186,SPIE, (2001),423-432.
Yoon, Si-Yeul.,et al. , “Evaluation of various alternating phase shifting mask processes for KrF lithography”,21st Annual BACUS Symposium on Photomask Technologyvol. 4562, No. II,SPIE, (2002),1017-1025.
Rosasco S.
Sandisk Corporation
Vierra Magen Marcus & DeNiro LLP
LandOfFree
Photomask features with interior nonprinting window using... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photomask features with interior nonprinting window using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask features with interior nonprinting window using... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3881988