Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-11-03
1998-08-11
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 430326, G03F 7023, G03F 730
Patent
active
057925860
ABSTRACT:
The present invention provides a positive photoresist composition comprising a 1,2-naphthoquinonediazide compound and a novolac resin obtained through a condensation reaction between an aldehyde compound and a phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.5, R.sub.6 and R.sub.7 each independently represents hydrogen atom, hydroxyl group or alkyl, cycloalkyl, alkoxy or alkenyl group having 6 or less carbon atoms or aryl group, provided that at least one of R.sub.5, R.sub.6 and R.sub.7 represents a cycloalkyl group having 6 or less carbon atoms. The composition of the present invention is excellent in the balance between properties such as sensitivity, resolution, heat resistance, profile, depth of focus, etc. and free from scum.
REFERENCES:
patent: 4123279 (1978-10-01), Kobayashi
patent: 5238771 (1993-08-01), Goto et al.
patent: 5468590 (1995-11-01), Hashimoto et al.
Hashimoto Kazuhiko
Osaki Haruyoshi
Uetani Yasunori
Chu John S.
Sumitomo Chemical Company Limited
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