Manufacturing method for semiconductor device and...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Bump leads

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE23021

Reexamination Certificate

active

10954649

ABSTRACT:
A manufacturing method for a semiconductor device, including the steps of: forming a passivation film that covers a surface of a semiconductor substrate on which electrodes have been formed, in which an opening is formed so as to expose a predetermined electrode from among the electrodes; forming a diffusion prevention plug of a first metal in the vicinity of the opening in the passivation film; supplying a second metal material to the surface of the semiconductor substrate on which the diffusion prevention plug has been formed, so as to form a seed layer of the second metal; forming a resist film that covers the seed layer and in which an opening is formed so as to expose a predetermined region of the seed layer on the diffusion prevention plug; supplying a third metal material into the opening in the resist film so as to form a protrusion electrode of the third metal; removing the resist film after the step of forming a protrusion electrode; and removing the seed layer after the step of forming a protrusion electrode.

REFERENCES:
patent: 6372622 (2002-04-01), Tan et al.
patent: 6413851 (2002-07-01), Chow et al.
patent: 6426281 (2002-07-01), Lin et al.
patent: 6489229 (2002-12-01), Sheridan et al.
patent: 6756294 (2004-06-01), Chen et al.
patent: 2002/0056901 (2002-05-01), Ono et al.
patent: 03-248528 (1991-11-01), None
patent: 2000-164623 (2000-06-01), None
patent: 2000-357702 (2000-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method for semiconductor device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method for semiconductor device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method for semiconductor device and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3870203

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.