High aspect ratio co-planar structure fabrication consisting...

Details High aspect ratio co-planar structure fabrication consisting... High aspect ratio co-planar structure fabrication consisting...

2007-10-09

2007-10-09

Klimowicz, William J (Department: 2627)

Dynamic magnetic information storage or retrieval

Head

Coil

C029S603230, C029S603250, C029S603180

Reexamination Certificate

active

10837386

ABSTRACT:
A a method for fabricating a structure, such as a magnetic head, having two coplanar metallic features of different compositions, both deposited on their own seed layers. The features may be made tall relative to their widths (ie. have a high aspect ratio), and are also very closely spaced. Only a single high-definition, critically aligned photolithographic procedure is used to create the critical structures, avoiding any problem with aligning features produced by multiple procedures. The method is applied to the production of the write structure of a magnetic read/write head, where a portion of the pole structure and the inductive coils are fabricated in the same plane with a close spacing and both having a vertical aspect ratio of more than about 2:1.

REFERENCES:
patent: 5665251 (1997-09-01), Robertson et al.
patent: 5673163 (1997-09-01), Cohen
patent: 5801521 (1998-09-01), Mizoguchi et al.
patent: 5805375 (1998-09-01), Fan et al.
patent: 5885750 (1999-03-01), Hsiao et al.
patent: 5901431 (1999-05-01), Santini
patent: 6051866 (2000-04-01), Shaw et al.
patent: 6156375 (2000-12-01), Hu et al.
patent: 6570739 (2003-05-01), Hsiao et al.
patent: 6804879 (2004-10-01), Hsiao et al.
patent: 7079355 (2006-07-01), Hsiao et al.
patent: 7117583 (2006-10-01), Dinan et al.
patent: 2002/0030928 (2002-03-01), Hsiao et al.
patent: 2004/0257701 (2004-12-01), Bedell et al.
patent: 2005/0050717 (2005-03-01), Yoshida et al.
patent: 2005/0189319 (2005-09-01), Guthrie et al.

Affiliated with

Also associated with

Rating

High aspect ratio co-planar structure fabrication consisting... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High aspect ratio co-planar structure fabrication consisting..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High aspect ratio co-planar structure fabrication consisting... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3866023