Method of making photolithographically-patterned...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S877000, C029S876000, C029S602100, C029S605000, C430S322000, C430S320000, C438S052000

Reexamination Certificate

active

11197675

ABSTRACT:
An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate plane without requiring high aspect ratio processing. The photolithographically patterned coil structure includes an elastic member having an intrinsic stress profile. The intrinsic stress profile biases a free portion away from the substrate forming a loop winding. An anchor portion remains fixed to the substrate. The free portion end becomes a second anchor portion which may be connected to the substrate via soldering or plating. A series of individual coil structures can be joined via their anchor portions to form inductors and transformers.

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