Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-12-25
2007-12-25
MacArthur, Sylvia R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S725000, C156S345520, C156S345530
Reexamination Certificate
active
11103542
ABSTRACT:
A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating assembly, cooling the substrate to the predetermined temperature using a cooling assembly located such that a thermal conductance region is provided between the heating and cooling assemblies, and adjusting a thermal conductance of the thermal conductance region to aid in heating and cooling of the substrate. The apparatus includes a heating assembly, a cooling assembly located such that a thermal conductance region is provided between the heating and cooling assemblies, and a structure or configuration for adjusting a thermal conductance of the thermal conductance region.
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Johnson Wayne L.
Strang Eric J.
MacArthur Sylvia R.
Tokyo Electron Limited
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