Phase shift mask including a substrate with recess

Details Phase shift mask including a substrate with recess Phase shift mask including a substrate with recess

2007-12-11

2007-12-11

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

11133233

ABSTRACT:
A phase shift mask includes a quartz substrate having a main surface partially dug, and a Cr film deposited on the main surface. The dug portion includes an undercut provided such that the Cr film partially serves as an eaves, and the Cr film has a π opening exposing a portion of the dug portion, and a first subopening exposing an end of the dug portion.

REFERENCES:
patent: 2005/0058915 (2005-03-01), Uematsu
patent: 2003-344987 (2003-12-01), None

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