Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-27
2007-02-27
Visconti, Geraldina (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
10439193
ABSTRACT:
A method for producing a mask set for lithography including at least one mask, has a predetermined layout of structures which are provided for imaging into a common exposure plane and which are transferred to the masks as a basis. Strongly coupled structures that are so closely adjacent one another, at least in sections, that they are strongly coupled in the case of simultaneous imaging are distributed between at least two different masks of the mask set.
REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 5306584 (1994-04-01), Palmer
patent: 5407763 (1995-04-01), Pai
patent: 5821014 (1998-10-01), Chen et al.
patent: 6543045 (2003-04-01), Ludwig et al.
patent: 2002/0110753 (2002-08-01), Pforr et al.
patent: 2003/0022074 (2003-01-01), Nolscher
patent: 2003/0091911 (2003-05-01), Noelscher
patent: 199 37 742 (2001-03-01), None
patent: 0770926 (1997-05-01), None
Minoru Sugawara et al.: “Evaluation of Phase-Shifting Masks for Dense Contact Holes Using the Exposure-Defocus and Mask Fabrication Latitude Methodology”, Jpn. J. Appl. Phys., vol. 33, Part 1, No. 12B, Dec. 1994, pp. 6801-6808.
Moukara Molela
Pufall Reinhard
Greenberg Laurence A.
Infineon Technolgies AG
Locher Ralph E.
Stemer Werner H.
Visconti Geraldina
LandOfFree
Method for producing a mask set for lithography including at... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing a mask set for lithography including at..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a mask set for lithography including at... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3852496