Resistance-reduced semiconductor device and methods for...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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C257S768000, C257S532000, C257S384000, C257SE27016, C257SE27033

Reexamination Certificate

active

11190913

ABSTRACT:
Semiconductor devices and methods for fabricating the same. The semiconductor device includes a resistance-reduced transistor with metallized bilayer overlying source/drain regions and gate electrode thereof. A first dielectric layer with a conductive contact overlies the resistance-reduced transistor. A second dielectric layer having a first conductive feature overlies the first dielectric layer. A third dielectric layer with a second conductive feature overlies the second dielectric layer, forming a conductive pathway down to the top surface of the metallized bilayer over one of the source/drain regions or the gate electrode layer.

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patent: 6727515 (2004-04-01), Nakata et al.
patent: 6737744 (2004-05-01), Fukuyama
patent: 7009279 (2006-03-01), Nasu et al.
patent: 7161248 (2007-01-01), Karasawa et al.
patent: 59-208450 (1984-11-01), None

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