Compositions – Etching or brightening compositions
Reexamination Certificate
2007-12-25
2007-12-25
Norton, Nadine G. (Department: 1765)
Compositions
Etching or brightening compositions
C252S079400, C438S692000
Reexamination Certificate
active
10524064
ABSTRACT:
The present invention is directed to a CMP polishing slurry comprising cerium oxide particles, an organic compound having an acetylene bond (triple bond between carbon and carbon) and water, and a method for polishing a substrate which comprises a step of polishing a film to be polished of the substrate with the polishing slurry. In a CMP (chemical mechanical polishing) technique for flattening inter layer dielectrics, insulating films for shallow trench isolation and the like in a manufacturing process of semiconductor devices, the present invention enables the effective and high-speed polishing.
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Enomoto Kazuhiro
Haga Kouji
Kurata Yasushi
Ootsuki Yuto
Hitachi Chemical Co. Ltd.
Norton Nadine G.
Umez-Eronini Lynette T.
Westerman, Hattori, Daniels & Adrian , LLP.
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