Reticle set, method for designing a reticle set, exposure...

Details Reticle set, method for designing a reticle set, exposure... Reticle set, method for designing a reticle set, exposure...

2007-02-13

2007-02-13

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

10725571

ABSTRACT:
A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.

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Notice of Grounds for Rejection, issued by Japanese Patent Office, mailed Jun. 21, 2005, for Japanese Patent Application No. P2002-352819, and English-language translation thereof.

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