Fullerenes to increase radiation resistance in polymer-based...

Details Fullerenes to increase radiation resistance in polymer-based... Fullerenes to increase radiation resistance in polymer-based...

2007-10-30

2007-10-30

Wu, David W. (Department: 1713)

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C205S782500, C428S421000, C524S495000

Reexamination Certificate

active

11226489

ABSTRACT:
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.

REFERENCES:
patent: 6491891 (2002-12-01), Klett et al.
patent: 6528231 (2003-03-01), Tajima et al.
patent: 6594073 (2003-07-01), Wang
patent: 6908572 (2005-06-01), Derbyshire et al.
patent: 2002/0086553 (2002-07-01), O'Donnell et al.
patent: 2003/0158323 (2003-08-01), Connell et al.
patent: 2004/0034177 (2004-02-01), Chen
Florence Eschbach, et al., Development of Polymer Membranes for 157 nm Lithography, Intel Corporation; Asahi Glass Company, LTD, Jan. 23, 2004, 14 pgs.
A. Tregub, et al., Development of Fluoropolymer Membranes Transparent and Resistant to 157 nm Exposure, 157 Symposium, Intel Corporation, Aug. 27, 2003, 34 pgs.

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