Method and system for inspecting a pattern

Details Method and system for inspecting a pattern Method and system for inspecting a pattern

2007-08-21

2007-08-21

Bella, Matthew C. (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

Reexamination Certificate

active

09571938

ABSTRACT:
The present invention relates to detection of defects with simple specification of the coordinates, in the inspection of an object having a plurality of patterns in which a portion having the two-dimensional repetition and portions having the repetition only in the X direction and in the Y direction are mixedly present. The cross comparison between a notice point and comparison points, for example which are repetitive pitches away from the notice point, is carried out, and only the portion having the difference which can be found out with any of the comparison points is extracted as a defect candidate, which results in that the portion having the two-dimensional repetition as well as the portion having the repetition only in the X direction or in the Y direction can be inspected. As a result, while the portion, such as an isolated point, having no repetition both in the X direction and in the Y direction is extracted as the defect candidate, the defect candidate is not treated as the defect in the case where the defect candidate of interest occurs regularly in a plurality of objects to be inspected, so that such a defect candidate is excluded to extract only a true defect.

REFERENCES:
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4448532 (1984-05-01), Joseph et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4587617 (1986-05-01), Barker et al.
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4771468 (1988-09-01), Batchelder et al.
patent: 4845558 (1989-07-01), Tsai et al.
patent: 4860371 (1989-08-01), Matsuyama et al.
patent: 5038048 (1991-08-01), Maeda et al.
patent: 5125040 (1992-06-01), Matsui et al.
patent: 5153444 (1992-10-01), Maeda et al.
patent: 5173719 (1992-12-01), Taniguchi et al.
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5513275 (1996-04-01), Khalaj et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5649022 (1997-07-01), Maeda et al.
patent: 5740272 (1998-04-01), Shimada
patent: 5767974 (1998-06-01), Higashiguchi et al.
patent: 5859698 (1999-01-01), Chau et al.
patent: 5880531 (1999-03-01), Hagiya et al.
patent: 0 117 559 (1984-09-01), None
patent: 0 129 751 (1985-01-01), None
patent: 0 243 639 (1987-11-01), None
patent: 57-196530 (1982-12-01), None
patent: 32-32250 (1991-10-01), None
patent: 4-348260 (1992-12-01), None
patent: 5-6928 (1993-01-01), None
patent: 62-94750 (1994-10-01), None

Affiliated with

Also associated with

Rating

Method and system for inspecting a pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for inspecting a pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for inspecting a pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3844015