Process for production of conductive catalyst particles,...

Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Inorganic carbon containing

Reexamination Certificate

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C502S182000, C429S047000, C429S047000

Reexamination Certificate

active

10477840

ABSTRACT:
A process for production of conductive catalyst particles, a process for production of a catalyst electrode capable of gas diffusion, an apparatus for production of conductive catalyst particles, and a vibrating apparatus. The process can effectively and uniformly coat the particles of a conductive powder with a catalytic substance.

REFERENCES:
patent: 3382105 (1968-05-01), McBryar et al.
patent: 5061778 (1991-10-01), Uchida et al.
patent: 2003/0031917 (2003-02-01), Katori et al.
patent: 2004/0142230 (2004-07-01), Katori et al.
patent: 2000-109969 (1800-04-01), None
patent: 52-20990 (1977-02-01), None
patent: 54-82394 (1979-06-01), None
patent: 5-36418 (1993-02-01), None
patent: 2000-293517 (2000-10-01), None
patent: 2001-87666 (2001-04-01), None
patent: 2002-110175 (2002-04-01), None
Long Y. Chiang et al.,Multi-hydroxy Additions onto C6o Fullerene Molecules, J. Chem. Soc., 1992 pp. 1791-1793.
Long Y. Chiang et al., Efficient Synthesis of Polyhydroxylated Fullerene Derivatives via Hydrolysis of Polycyclosulfated Precursors, American Chem. Society, 1994, pp. 3960-3969.

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